Repository of BSUIR

Professional interests/researches:
control of the size of submicron planar structures and equipment for these purposes.

Education:
Faculty of Physics, BSU, postgraduate study at the Institute of Physics of the National Academy of Sciences of Belarus, postgraduate study at EE "BSUIR".

Working career:
head of department-deputy. ch. engineer of JSC "Planar", dissertation work "Methods of opto-electronic registration of critical dimensions of submicron planar structures of microelectronic products", project management related to the direction of creating equipment for controlling the geometric dimensions of microelectronic structures at JSC "Planar".

Taught academic subjects:
control systems for electronic-optical complexes,
foundations of the theory of automatic control systems.

Main publications:
• Integrated technologies of micro - and nanostructured layers / A.P. Dostanko, S.M. Avakov, L. P. Anufriev, S. V. Bordusov, D. A. Golosov, S. M. Zavadsky, N. S. Kovalchuk, A. O. Korobko, V. L. Lanin, S. I. Madveiko, V.A. Rusetsky, E.V. Telesh, E.A.Titko, G.A. Trapashko. - Minsk, Bestprint, 2013, - 189 p.
• Technological complexes of integrated processes for the production of electronics products / A.P. Dostanko, S.M. Avakov, O. A. Ageev, M.P. Batura, S. V. Bordusov, D. A. Golosov, V. N. Dzhuplin, S.M. Zavadsky, O.V. Klim, V.L. Lanin, S.I. Madveiko, S.N. Melnikov, I.B. Petukhov, G.E. Retyukhin, A.M. Rusetsky, D.S. Titko, V.S. Tomal, G.A. Trapashko, S.B. Cherednichenko, D.I. Schoolchildren. - Minsk, Belaruskaya Navuka 2016, - 251p.
• Introduction to the design of photomasks for the manufacture of micro- and nanosystems. Cadence MaskCompose / V.A. Bespalov, A.N. Kononov, M.G. Putrya, V.Yu. Kireev, G. A. Trapashko, D. Yu. Nemchin, V.A. Cherkashin, D.M. Milenky, D.V. Bazanov, V.A. Ovchinnikov, A.T. Verevkin, V.N. Sidorenko. - Moscow, BINOM. Knowledge Laboratory, 2013 .-- 250 p.
• Introduction to the design of photomasks for the manufacture of micro- and nanosystems. Mentor Graphics / V.A. Bespalov, A.N. Kononov, M.G. CM. Avakov, A.L. Glebov, V.Yu. Kireev, A.L. Lokhov, G.A. Trapashko, D.M. Milenky, D.Yu. Nemchin, A.V. Rabovolyuk, N.A. Kononov. - Moscow, BINOM. Knowledge Laboratory, 2014 .-- 207 p.
• Introduction to the design of photomasks for the manufacture of micro- and nanosystems. Synopsys CATS, Mentor Graphics, Cadence MaskCompose / S. M. Avakov, A. L. Glebov, V.Yu. Kireev, N.A. Kononov, A.L. Lokhov, M.A. Belozerov, E.N. Ivanova, D.M. Milenky, S.I. Morozov, D.Yu. Nemchin, A.V. Rabovolyuk, D.S. Radchenko, G.A. Trapashko, V.A. Cherkashin - Moscow, BINOM. Knowledge Laboratory, 2016 .-- 348 p.
• Trapashko, G.A. Synthesis of the optoelectronic system of the installation for monitoring microelectronic structures / G.A. Trapashko // Science and technology. - 2014. -№1. - S. 38-43.
• Network controllers for controlling technical equipment / A.V. Bezlyudov, N.I. Gaikov, L.V. Lanin, V.P. Oger, G.A. Trapashko. // Control Engineering Russia - 2015. - No. 3 (57). - S. 56 - 59.
• Avakov S. M. Autofocusing in installations for automatic control of defects in the topological pattern of photomasks and semiconductor wafers / S.М. Avakov, A.V. Bezlyudov, N.I. Gaikov, L.V. Lanin, V.P. Oger, D.S. Titko, G.A. Trapashko. // Electronics manufacturing. - 2015. - No. 5. - S. 125 - 128.